How to Save Money When Buying ito sputtering targets

Our ISO : certified Materials Division stocks a vast assortment of high purity materials, evaporation sources, and crucible liners for use in both thermal and E-beam evaporation as well as sputter deposition processes. We offer pure elements, compounds, alloys, ceramics, intermetallics, and mixtures in a variety of shapes, sizes, and purities for both R&D and Production applications. Each sputtering target and evaporation material ships complete with a Certificate of Analysis and SDS. We also provide in-house sputter target bonding and precious metals reclamation services, saving you both time and money.

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Patterned ITO Wafers

An application scientist requested a quote for the following.

I am looking to source some custom made patterned ITO wafers. We are developing a new calibration product for optical microscopes, and need a very specific pattern of ITO on a glass substrate. Can you provide this type of service, and if not, could you recommend to me any suggestions? 

We don't have a mask but would like the patterning to be based upon a standard resolution target called the ' USAF target'. Also, it's important for the glass substrate to be optically flat, with similar properties to so called 'parallel-optical flats' (lambda/20 flatness). We can provide these if necessary, but do you have any specs on the substrate.   flatness? Finally, can we'd like to vary the ITO thickness from ~10 nm to ~ 100 nm either over different regions of the same wafer, or over several different wafers. Is this something that you could do for us? 

Reference # for specs and pricing.

ITO Wafers for Spin Curve Testing

A PhD candidate requested a quote for the following.

I am looking for basic ITO coated glass wafers 6" in diameter. Thickness is not really an issue for me and shouldn’t change the properties of the spin curve, so whatever is the standard thickness and/or cheaper., for basic spin curve testing.

Reference # specs and pricing.

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Indium-tin-oxide (ITO) coated substrates

ITO high light transmission and high-conductivity are great for Liquid Crystal Displays (LCD).

Bare (unpatterned) indium-tin-oxide (ITO) glass
(e.g. 15 ohm/sq.; 25 mm x 25 mm; < USD 1.5)

Patterned indium-tin-oxide (ITO) glass
(e.g. 15 ohm/sq.; 25 mm x 25 mm; < USD 1.5)

Bare ITO coated plastic film [PET, PEN]
Patterned ITO coated plastic films [PET, PEN]


Discount 60 ohm/sq ITO coated PET film (0.125mm)

ITO glass Specifications

Product configuration
Glass / SiO2 buffer (~23 nm) / ITO
ITO coating
Magnetron sputtering
ITO patterning
Photolithography
Size
Any size up to 14”x 16”
Typical sheet resistance

(ohm/sq)
6, 10, 13, 15, 20, 60, 100, 250, etc

(Others are also available for volume production)
Substrate thickness (mm)
0.4, 0.55, 0.7, and 1.1
Pre-patterned
Via photofilm or Cr mask

ITO plastic film

Specifications
Product configuration
Polyethylene terephthalate (PET) / ITO

PEN / ITO

ITO coating
Magnetron sputtering
ITO patterning
Lithography / Screen-printing / Laser patterning
Size
Sheet / roll (width <= mm)
Typical sheet resistance (ohm/sq)
6, 10, 14, 20, 50, 60, 80, 100,

120, 150, 250, 300, 350, 450, 500
Substrate thickness (mm)
0.125, 0.175, 0.188, 0.21

ITO Physical properties
ITO Work function
4.9 eV (UPS)

We offer consultation for ITO cleaning

4.8-4.9 eV (UPS)

(after exposed to Chloro-based solvents)
ITO thickness
Usually, up to 125 nm
Micro-roughness
RMS 1-2 nm (Digital Instrument AFM)
Optical transmission
> 85% at 555 nm.

Fluorine-tin-oxide (FTO) coated substrates

For solar/photovoltaics applications: e.g dye-sensitized cells, organic solar cells
For display applications: transparnt conducting electrode for top emitting displays
Others: heated glass, mirrors, computer screens, EMI/RFI shielding, oven windows, electro-optical, insulating applications
Bare and Patterned fluorine-tin-oxide (FTO) glass


FTO products:

• Pilkington FTO glass (TEC Glass)
• Nippon Sheet Glass FTO glass
• Normal FTO glass
  
  
  

  Pilkington FTO glass (TEC series)

  Used for solar applications:
• 
  Specifications
  FTO glass manufacturer
  Pilkington, USA
  Size
  Up to 14”x 16” (355mm x 406mm)
  Typical sheet resistance (ohm/sq)
  TEC#
  ohm/sq
  8
  
  15
  
  70
  
  250
  
  
  
  
  <= 9
  
  <= 14
  
  <= 80
  
  <= 280
  
  <=
  
  <=
  Substrate
  Clear soda lime float glass
  
  ASMT C--91 or better
  Substrate thickness (mm)
  2.5 - 6
  Optical transmission
  Daylight: 83-88 %
  
  Solar: 61-81 %
  Haze
  TEC#
  %
  8
  
  15
  
  70, 250,
  > 2
  
  < 0.7
  
  < 0.5
  Product features
  Color neutral, low emissivity
  
  Durable pyrolytic (hard coat) surface
  
  Bendable
  
  

  Nippon Sheet Glass FTO

  
  for solar applications
  Specifications
  FTO glass manufacturer
  Nippon Sheet Glass Co. Ltd., Japan
  Size
  <= 14” x 16” or 300mm x 300mm
  Typical sheet resistance (ohm/sq)
  < 7 and 13
  Substrate
  Soda lime float glass
  Substrate thickness (mm)
  2.2 and 3.1 +/- 0.2
  Visible transmission
  > 77 %
  Haze
  >8 %
  
  

  Normal FTO glass

  
  Specifications
  FTO glass manufacturing
  PRC
  Size
  Any size up to 300mm x 300mm
  Typical sheet resistance (ohm/sq)
  <15
  Substrate
  Clear soda lime float glass
  Substrate thickness
  2.2 mm
  
  Remark: Customer services including patterning are available. We can offer patterning service for your ITO substrates.

What Is Spin Curve Testing?

Spin Curve Testing

Spin curve testing is a characterization method used in spin coating to determine the relationship between spin speed and film thickness for a given resist or coating material.

Purpose of Spin Curve Testing

• Establish the optimal spin speed for achieving a desired film thickness.
• Ensure uniform film thickness across the wafer.
• Optimize process parameters for photoresists, sol-gels, polymers, or other thin films.
• Determine the coating behavior of new materials.

How It Works

1. Prepare the Substrate:

   • Use a clean silicon wafer, glass, or other substrate.
   • Ensure the surface is dry and free of contaminants.

2. Dispense the Material:

   • Apply a fixed volume of photoresist, polymer, sol-gel, or another coating solution at the wafer center.

3. Spin at Different Speeds:

   • Perform spin coating at multiple speeds (e.g., 500– rpm).
   • Keep spin duration constant (typically 30–60 seconds).

4. Measure Film Thickness:

   • Use an ellipsometer, profilometer, or interferometric method to measure thickness after each spin.

5. Plot the Spin Curve:

   • Graph thickness vs. spin speed on a log-log plot.

   • The relationship follows the empirical equation:

     t=k⋅ω−nt = k \cdot \omega^{-n} t = k ⋅ ω −n

     where:

     • tt t = film thickness
     • kk k = material constant
     • ω\omega ω = spin speed (rpm)
     • nn n = spin exponent (typically 0.5–0.7 for Newtonian fluids)

Interpreting the Spin Curve

• Higher spin speeds = Thinner films (due to higher centrifugal force).
• Lower spin speeds = Thicker films (due to reduced solvent evaporation).
• Deviations from the expected curve indicate issues like solvent drying too fast, poor viscosity control, or uneven dispensing.

Applications

• Photoresist coating in lithography.
• Dielectric & polymer coatings in semiconductor processing.
• Optical coatings (e.g., sol-gel for anti-reflection layers).
• Biosensor & MEMS coatings.

Would you like help analyzing a specific spin curve dataset?

ITO Coated Glass Wafers

A postdoc requested a quote for the following.

I am interested in glass wafer coated with ITO. In your website I found these options ITO Wafers
< 10 ohm/sq ITO coated SiO2 wafer

Surface: Polished grade
Size: 4" dia. x 0.55mm
<7 ohm/sq ITO coated SiO2 wafer

Surface: Polished grade
Size: 4" dia. x 1.1mm

The number before the price is the minimum number of wafers for a single order or indicates the price range. I am asking because I prefer the second kind of wafers but I need no more than 10.

Reference # for specs and pricing.

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ITO Wafers for Nanoimprint Lithography Applications

A graduate student requested a quote for the following.

I am interested in purchasing ITO wafers, and I have a few questions regarding the specs. Can you give me a figure for the surface roughness on both sides of the glass wafer? I need both surfaces to be as smooth as possible, less than 1nm of surface roughness (Ra), for nanoimprint lithography application.

Please let me know if you see ITO wafers of this surface quality.

Reference # for specs and pricing.

ITO Wafers Transmission Curve

A PhD candidate requested a quote for the following.

I am interested in square ITO wafers features on your website :

7 ohm/sq ITO coated polished glass Size: 50mm x 50mm, 700um thick (ID )
7 ohm/sq ITO coated polished glass Size: 100mm x 100mm, 700um thick (ID )

There are some questions I want to ask before ordering:
Do you offer a choice of glass type (D263, BK7, etc.)?

What are the tolerances on the mentioned dimensions and thickness?
Is there ITO on all the surface of the wafers or is there a zone without coating near the edges?
Do you have a transmission curve of this particular ITO thickness (7ohm/sq)?

Reference # for specs and pricing.

What is ITO Thin Film?

An ITO (indium tin oxide) thin film is a type of transparent conductive film that is commonly used in a variety of electronic devices, including smartphones, tablets, and LCD (liquid crystal display) televisions. ITO thin films are made by depositing a thin layer of indium tin oxide onto a substrate, such as glass or plastic.

One of the key properties of ITO thin films is their ability to conduct electricity while also being transparent. This makes them ideal for use in devices that require both electrical conductivity and the ability to display images or other information to the user.

In addition to their use in display technology, ITO thin films are also used in a variety of other applications, including solar cells, touch screens, and EMI (electromagnetic interference) shielding.

There are a number of different methods that can be used to create ITO thin films, including sputtering, evaporation, and chemical vapor deposition. The specific method chosen will depend on the desired properties of the film and the requirements of the application.

What is ITO Coating?

ITO (indium tin oxide) coating is a thin layer of material that is applied to a surface to create an electrically conductive layer. ITO coatings are often used in electronic devices, such as smartphones, tablets, and LCD displays, to provide electrical conductivity to the device's touch screen.

ITO coatings are transparent, allowing light to pass through them, which makes them well-suited for use in displays. They are also highly conductive, which allows them to transmit electrical signals with minimal resistance. In addition, ITO coatings are durable and resistant to wear, which makes them ideal for use in touch screens that are subjected to frequent use.

ITO coatings are typically applied using a sputtering process, in which a thin layer of ITO is deposited onto the surface of the device using high-energy particles. The ITO coating is then patterned and etched to create the desired electrical connections and touch-sensitive areas.

Overall, ITO coatings are an important component of many electronic devices, as they enable the device to function as a touch screen and interact with users through electrical signals.

Indium Tin Oxide Coated Glass for Sale

MAIN PRODUCTS buy online and save!

• ITO coated glass
• ITO coated plastic film (PET, PEN, etc)
• Fluorine-tin-oxide FTO coated glass
• FPD and ITO glass detergents

ITO Glass Sizes Inlcude But Not Limited To:

• 300mm x 400mm
• 400mm x 500mm
• 450mm x 550mm

ITO glss slides Sizes

• 25mm x 25mm
• 25mm x 75mm
• 50mm x 75mm

We have the following Indium Tin Oxide wafers. Please let us know if any interest you. Or if you know of better pricing elsewhere!

ITO Wafers - Buy online now and SAVE! Item Dia Thk Description 25mm Sq 1.1mm 15-20 ohm/sq ITO glass Size: 25mm x 25mm Please specify thickness from 1.1 or 0.7mm  75mm x 25mm 0.7mm 5-20 ohm/sq ITO glass Size: 75mm x 25mm Please specify thickness from 1.1 or 0.7mm O 50mm Sq 0.7mm ITO coated boro-aluminosilicate glass 50mm x 50mm x 0.7mm ​​Non-alkaline TFT grade 150mm Sq 1.1mm 10 ohm/sq ITO coated polished glass Size: 150mm x 150mm Specify thickness 1.1 or 0.7mm 

< 10 ohm/sq ITO coated SiO2 wafer
Surface: Polished grade
Size: 4" dia. x 0.55mm

10 $65.90 each
25 $55.90 each
50 $47.90 each
100 $43.00 each

----------
<20 ohm/sq ITO coated SiO2 wafer
ITO thickness: ~ 100nm +/-10nm
Surface: Polished grade
Size: 4" dia. x 1.1mm

25 $34.90 each
50 $30.90 each
100 $25.90 each

----------
<20 ohm/sq ITO coated SiO2 wafer
ITO thickness: ~ 100nm +/-10nm
Surface: Polished grade
Size: 4" dia. x 0.7mm
25 $38.90 each
50 $34.90each
100 $30.90 each

----------
< 10 ohm/sq ITO coated SiO2 wafer
Surface: Polished grade
Size: 4" dia. x 1.1mm
25 $38.90 each
50 $34.90each
100 $30.90 each

----------
< 10 ohm/sq ITO coated SiO2 wafer
Surface: Polished grade
Size: 4" dia. x 0.7mm
25 $43.00 each
50 $38.90each
100 $34.90 each

----------
<7 ohm/sq ITO coated SiO2 wafer
Surface: Polished grade
Size: 4" dia. x 1.1mm
25 $43.00 each
50 $38.90each
100 $34.90 each

----------
<7 ohm/sq ITO coated SiO2 wafer
Surface: Polished grade
Size: 4" dia. x 0.7mm
25 $43.00 each
50 $38.90each
100 $34.90 each

----------
<7 ohm/sq ITO coated SiO2 wafer
Surface: Polished grade
Size: 4" dia. x 0.7mm
25 $51.90 each
50 $43.00 each
100 $38.90 each

Indium Tin Oxide (ITO) Coated PET Sheet

Coating Properties:

• Specified ITO Sheet resistivity – ≤ 15 ohms/sq
• Typical ITO Sheet resistivity – 8 10 ohms/sq
• Transmittance at 550nm – ≥ 75%
• ITO film Thickness – - Å
• Sheet Thickness – 0.175 mm or 175 micron
• Haze – NA
• Heat resistance (R/R0) - ≤1.3 (@130°C, 30min)
• Hear storage (R/R0) - ≤1.3 (@90°C x 250hrs)
• High humidity storage (R/R0) - ≤1.3 (@60°C x 250hrs, 95% RH)
• Heat cycle (R/R0) - ≤1.3 (@-30°C 85°C x 50 cycle)
• Adhesive- Excellent (@1.0kg x 25 cycle with cloth)
• Surface check - Smooth, no holes, no patches and no stain
• Storage temperature - -30°C +40°C
• Brand – UniversityWafer, Inc.

Physical Properties:

• Configuration – Polyethylene terephthalate (PET) / ITO
• Substrate – Optical clear grade PET film / Hardcoated PET film
• Surface finished of glass – N/A
• Passivation layer – No
• ITO coating method – Magnetron sputtering at elevated temperature under vacuum
• ITO work function – 4.8 4.9eV (measured by UPS) after proper cleaning
• Surface Roughness – RMS1 10 nm, depend on the various product
• Packing - Sheet/roll form

Indium Tin Oxide (ITO) Coated PET Sheet Product Series: TIPZ

Coating Properties:

• Specified ITO Sheet resistivity – 60 ohms/sq
• Typical ITO Sheet resistivity – 70 ohms/sq
• Transmittance @ 550nm – ≥ 8 %
• ITO film Thickness 350 to 370 Å
• Sheet Thickness – 0.175 mm or 175 micron
• Haze – NA
• Heat resistance (R/R0) - ≤1.3 (@13 °C, 30min)
• Hear storage (R/R0) - ≤1.3 (@9 °C x 250hrs)
• High humidity storage (R/R0) - ≤1.3 (@6 °C x 250hrs, 95% RH)
• Heat cycle (R/R0) - ≤1.3 (@-30°C 85°C x 50 cycle)
• Adhesives - Excellent (@1.0kg x 25 cycle with cloth)
• Surface check - Smooth, no holes, no patches and no stain
• Storage temperature - -30°C +40°C
• Brand – UniversityWafer, Inc.

Physical Properties:

• Configuration – Polyethylene terephthalate (PET) / ITO
• Substrate – Optical clear grade PET film / Hardcoated PET film
• Surface finished of glass – N/A
• Passivation layer – No
• ITO coating method – Magnetron sputtering at elevated temperature under vacuum
• ITO work function – 4.8 4.9eV (measured by UPS) after proper cleaning
• Surface Roughness – RMS1 10 nm, depending on the various product
• Packing - Sheet/roll form

What are ITO Wafers Used for?

Indium tin oxide (ITO) wafers are thin sheets of material made from a mixture of indium and tin oxide. They are used in a variety of electronic and optoelectronic applications due to their high conductivity, transparency, and ability to be easily patterned.

One of the main uses of ITO wafers is in the manufacture of touch screens for electronic devices, such as smartphones and tablets. The ITO wafer is typically coated onto a glass or plastic substrate to create a touch-sensitive surface that can detect the location and movement of a user's finger. The ITO coating is then patterned and etched to create the desired electrical connections and touch-sensitive areas.

Indium Tin Oxide (ITO) Wafers Used in Touch Screen Manufacturing Transparent Conductive Coating (In₂O₃-SnO₂) Typical Thickness: 100-300 nm

ITO wafers are also used in the manufacture of LCD (liquid crystal display) screens, which are found in a wide range of electronic devices, including TVs, computer monitors, and laptops. The ITO wafer is used to create the transparent electrode layer that is required for the LCD screen to function.

In addition to their use in touch screens and LCD displays, ITO wafers are also used in a variety of other electronic and optoelectronic applications, such as solar cells, LED lighting, and thin film transistors. They are also used in the manufacture of a range of other electronic components and devices, including sensors, detectors, and RFID (radio-frequency identification) tags.

How can indium tin oxide be conductive and transparent at the same time?

Indium Tin Oxide (ITO) is both conductive and transparent due to its unique electronic band structure and optical properties.

1. Transparency

ITO is a wide-bandgap semiconductor with a bandgap of around 3.5–4.3 eV. This means:

• Visible Light Passes Through: The bandgap is larger than the energy of visible light (~1.8–3.1 eV), so photons in the visible spectrum do not have enough energy to excite electrons from the valence band to the conduction band. As a result, visible light is not absorbed and ITO appears transparent.
• Absorbs in UV & Reflects IR: Higher-energy UV photons can excite electrons across the bandgap, making ITO absorbent in the UV range. Additionally, free electrons in the conduction band interact with lower-energy IR photons, leading to high reflectance in the infrared.

2. Conductivity

ITO is conductive due to its high carrier concentration:

• Doped Semiconductor Behavior: Tin (Sn) dopants introduce extra free electrons into the conduction band (n-type doping), making ITO a highly degenerate semiconductor.
• Metallic-like Conductivity: The high electron concentration (~−^{20} - 10^{21} 10 20 − 10 21 cm−3^{-3} −3) causes ITO to behave similarly to metals in terms of electrical conductivity.
• Low Electron Scattering: The structure allows for relatively low electron scattering, ensuring good conductivity while maintaining transparency.

3. Balancing Transparency and Conductivity

There is a trade-off:

• Higher doping increases conductivity but can reduce transparency due to free carrier absorption and plasmonic effects in the near-infrared.
• Lower doping improves transparency but decreases conductivity.

This balance makes ITO an ideal transparent conductive oxide (TCO), commonly used in touchscreens, solar cells, and display technologies.

You said:

How does one etch an indium-tin oxide?

ChatGPT said:

Etching Indium Tin Oxide (ITO) can be challenging due to its chemical resistance, but several methods exist, each with different advantages depending on precision, selectivity, and process compatibility. Here are the main approaches:

1. Wet Chemical Etching

Wet etching is commonly used for ITO patterning because of its simplicity and cost-effectiveness.

Common Etchants:

• Hydrochloric Acid (HCl) + Nitric Acid (HNO₃) (or Aqua Regia)

  • Reaction: In2O3+6HCl→2InCl3+3H2O\text{In}_2\text{O}_3 + 6HCl \rightarrow 2InCl_3 + 3H_2O In 2​ O 3​ + 6HCl → 2InCl 3​ + 3H 2​ O SnO2+4HCl→SnCl4+2H2O\text{SnO}_2 + 4HCl \rightarrow SnCl_4 + 2H_2O SnO 2​ + 4HCl → SnCl 4​ + 2H 2​ O
  • Pros: Fast and effective.
  • Cons: Aggressive, requires careful handling.
  • Example Mixtures:
    • HCl : HNO₃ : H₂O (4:1:40)
    • HCl (37%) at 50–60°C for faster etching.

• Ferric Chloride (FeCl₃)

  • Pros: Less aggressive than acid mixtures.
  • Cons: Leaves Fe residues, requiring additional cleaning.

• Oxalic Acid (C₂H₂O₄)

  • Pros: Good selectivity for ITO over some substrates.
  • Cons: Slower etching rate.

Process Considerations:

• Heat the etchant to 40–60°C to increase etch rate.
• Use photoresist as a mask (positive resist for selective etching).
• Post-etch rinse with DI water to remove residues.

2. Dry Etching (Plasma or RIE)

Reactive ion etching (RIE) is preferred for high-resolution ITO patterning.

Common Gases for ITO RIE:

• BCl₃ / Cl₂ / Ar (Chlorine-based)
  • Forms volatile InCl₃ and SnCl₄, which are easily removed.
• CF₄ / O₂ (Fluorine-based)
  • Fluorine etches ITO but at a slower rate.
• HBr / Ar
  • Used for high aspect ratio etching.

Process Considerations:

• Lower pressure (~10–50 mTorr) improves anisotropy.
• Higher RF power (100–300 W) increases etch rate.
• O₂ can be added to enhance the reaction with the resist mask.

3. Lift-Off Technique (Alternative to Etching)

Instead of etching ITO, you can deposit ITO onto a patterned resist and then remove the resist to create patterns.

Steps:

1. Spin-coat photoresist and pattern with lithography.
2. Deposit ITO (e.g., via sputtering).
3. Lift off resist with solvent (e.g., acetone, NMP).
4. Ultrasonic agitation may be required for clean lift-off.

Pros & Cons:

• Pros: Avoids difficult etching steps.
• Cons: ITO adhesion to resist can lead to poor edge definition.

Choosing the Right Method

Method Precision Selectivity Suitability for Large Areas Suitability for Fine Features Wet Etching Low Moderate Good Poor Dry Etching (RIE) High High Moderate Excellent Lift-Off Moderate High Limited Good

For thin ITO layers (<100 nm), wet etching is often sufficient. For sub-micron precision, RIE is the best choice.

Contact us to discuss your requirements of titanium sputtering targets. Our experienced sales team can help you identify the options that best suit your needs.